Method and apparatus for correcting assist-feature-printing errors in a layout
US7979812B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 30, 2009 |
| Grant date | Jul 12, 2011 |
| Priority date | — |
| Expiry date | Sep 18, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/705
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
One embodiment of the present invention provides a system that adjusts assist features in a layout to prevent assist features from printing. During operation, the system receives a layout. The system then identifies an assist-feature (AF)-printing hotspot in the layout, wherein the AF-printing hotspot includes a set of assist features and one or more target patterns in proximity to the set of assist features. At least one assist feature in the set of assist features is expected to print during a lithography process. Next, the system modifies the AF-printing hotspot by: (1) modifying the set of assist features; and (2) performing optical-proximity-correction (OPC) on the one or more target patterns. The system then performs a lithography simulation on the modified AF-printing hotspot to determine if: (1) a through-process-window associated with the modified AF-printing hotspot is acceptable; and (2) no assist feature in the modified set of assist features is expected to print. If so, the system replaces the AF-printing hotspot with the modified AF-printing hotspot.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.