Method of manufacturing monocrystalline silicon micromirrors
US7981303B2 · kind B2 · utility
6Cited by
10References
8Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2008 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Aug 24, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81B2201/042
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A novel silicon micromirror structure for improving image fidelity in laser pattern generators is presented. In some embodiments, the micromirror is formed from monocrystalline silicon. Analytical- and finite element analysis of the structure as well as an outline of a fabrication scheme to realize the structure are given. The spring constant of the micromirror structure can be designed independently of the stiffness of the mirror-surface. This makes it possible to design a mirror with very good planarity, resistance to sagging during actuation, and it reduces influence from stress in reflectivity-increasing multilayer coatings.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.