Polymer and chemically amplified resist composition comprising the same
US7981985B2 · kind B2 · utility
1Cited by
1References
6Claims
0Family size
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Key dates
| Filing date | Apr 17, 2009 |
| Grant date | Jul 19, 2011 |
| Priority date | — |
| Expiry date | Oct 13, 2029 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC08F220/283
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
The present invention provides a polymer containing a structural unit represented by the formula (Ia) or (Ib):wherein R1, R2, R3, n, Z1, R4, R5 and m are defined in the specification, a structural unit represented by the formula (II):wherein R6, R7, R8, R9, Z2, n′ and Z′ are defined in the specification, and a structural unit represented by the formula (III):wherein R10, R11, 1′ and Z3 are defined in the specification.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.