Patent · US Active

System and method for making photomasks

US7984393B2 · kind B2 · utility

6Cited by

2References

7Claims

0Family size

Assignee

TEXAS INSTRUMENTS INCORPORATED · US

Inventors

Thomas J. Aton · Dallas, US
Carl A. Vickery · Garland, US

Key dates

Filing date	Nov 14, 2007
Grant date	Jul 19, 2011
Priority date	—
Expiry date	Jun 5, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/70
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The present disclosure is directed a method for preparing photomask patterns. The method comprises receiving drawn pattern data for a design database, the drawn pattern data describing device circuit features and dummy features. The dummy features have first target patterns. Mask pattern data is generated for the dummy features, wherein one or more of the dummy features have second target patterns that are different from the first target patterns. The mask pattern data is corrected for proximity effects.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.