Method of providing consistent quality of target material removal by lasers having different output performance characteristics
US7985942B2 · kind B2 · utility
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6Claims
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Key dates
| Filing date | May 17, 2005 |
| Grant date | Jul 26, 2011 |
| Priority date | — |
| Expiry date | Jul 8, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05K2203/163
- WIPO fieldMachine tools
- WIPO sectorMechanical engineering
Abstract
Laser pulse energy adjustments are motivated by an understanding of the effect of laser pulse width variations among different lasers on satisfying a quality metric associated with a laser-processed target. In a preferred embodiment, the adjustments normalize this effect among different lasers drilling vias in a target specimen. The number of pulses delivered to the target specimen to form each via can be modified, based on the pulse energy applied to the via location, to control different via quality metrics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.