Method for determining the centrality of masks
US7986409B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 26, 2008 |
| Grant date | Jul 26, 2011 |
| Priority date | — |
| Expiry date | Nov 15, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30148
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for determining the centrality of masks is disclosed. The mask is positioned in a coordinate measuring device on a measurement table displaceable in a direction perpendicular to the optical axis of an imaging measurement system in an interferometrically measurable way. The position of a mask coordinate system with respect to the measuring device coordinate system is determined based on at lest two structures on the mask. The relative distance from one of the at least first and second outer edges to the at least two structures is determined. The coordinate measuring machine determines the actual coordinates of the at least two structures with respect to the respective outer edges, which must not exceed a predetermined deviation from a desired value.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.