Patent · US Active

Microlithography illumination systems, components and methods

US7990520B2 · kind B2 · utility

0Cited by

3References

14Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Berndt Warm · Arnstorf, DE
Guenther Dengel · Heidenheim, DE

Key dates

Filing date	Dec 17, 2007
Grant date	Aug 2, 2011
Priority date	—
Expiry date	Jan 30, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70133
WIPO fieldOptics
WIPO sectorInstruments

Abstract

The disclosure relates to microlithography systems, such as EUV microlithography illumination systems, as well as related components, systems and methods.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.