Patterning method of metal oxide thin film using nanoimprinting, and manufacturing method of light emitting diode
US7994053B2 · kind B2 · utility
7Cited by
1References
19Claims
0Family size
Assignee
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Key dates
| Filing date | Dec 30, 2009 |
| Grant date | Aug 9, 2011 |
| Priority date | — |
| Expiry date | Dec 30, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/872
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for forming a metal oxide thin film pattern using nanoimprinting according to one embodiment of the present invention includes: coating a photosensitive metal-organic material precursor solution on a substrate; pressurizing the photosensitive metal-organic material precursor coating layer to a mold patterned to have a protrusion and depression structure; forming the metal oxide thin film pattern by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer to cure it; and removing the patterned mold from the metal oxide thin film pattern.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.