Characterization and reduction of variation for integrated circuits
US8001516B2 · kind B2 · utility
116Cited by
91References
61Claims
0Family size
Assignee
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Key dates
| Filing date | Jun 2, 2008 |
| Grant date | Aug 16, 2011 |
| Priority date | — |
| Expiry date | Aug 28, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/39
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method and system are described to reduce process variation as a result of the semiconductor processing of films in integrated circuit manufacturing processes. The described methods use process variation and electrical impact to modify the design and manufacture of integrated circuits.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.