Patent · US Active

Characterization and reduction of variation for integrated circuits

US8001516B2 · kind B2 · utility

116Cited by
91References
61Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 2, 2008
Grant dateAug 16, 2011
Priority date
Expiry dateAug 28, 2029

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06F30/39
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method and system are described to reduce process variation as a result of the semiconductor processing of films in integrated circuit manufacturing processes. The described methods use process variation and electrical impact to modify the design and manufacture of integrated circuits.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.