Patent · US Active

Apparatus and methods for ambient air abatement of electronic manufacturing effluent

US8003067B2 · kind B2 · utility

6Cited by
15References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 21, 2008
Grant dateAug 23, 2011
Priority date
Expiry dateSep 24, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02W10/37
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

An abatement system is provided which includes 1) an abatement unit adapted to abate effluent; and 2) an ambient air supply system. The ambient air supply system includes an air moving device, wherein the ambient air supply system is adapted to supply ambient air to the abatement unit for use as an oxidant. Numerous other aspects are provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.