Illumination system for a microlithographic projection exposure apparatus

US8004656B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Damian Fiolka · Oberkochen, DE
• Manfred Maul · Aalen, DE
• Vladimir Davydenko · Bad Herrenalb, DE
• Axel Scholz · Aalen, DE
• Markus Deguenther · Aalen, DE
• Johannes Wangler · Oberkochen, DE

Key dates

• Filing date: Aug 17, 2006
• Grant date: Aug 23, 2011
• Expiry date: May 20, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70108
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.