Measuring apparatus, exposure apparatus and method, and device manufacturing method
US8004691B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 24, 2006 |
| Grant date | Aug 23, 2011 |
| Priority date | — |
| Expiry date | Apr 4, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01M11/0271
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A measuring apparatus includes a pinhole mask, located on an object plane of an optical system to be measured, and having a plurality of pinholes for generating a spherical wave from a measuring light beam, and a diffraction grating for splitting the measuring light beam that has passed the pinhole mask and the optical system, in which Lg=m·Pg2/λ is met, where Pg is a grating pitch of the diffraction grating, λ is a wavelength of the measuring light beam, m is an integer other than zero, and Lg is a distance between the diffraction grating and an image plane of the optical system. The measuring apparatus detects an interferogram formed by interference between a plurality of the measuring light beams split by the diffraction grating. The plurality of measuring light beams includes an aberration of the optical system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.