Resist composition and method of forming resist pattern
US8007981B2 · kind B2 · utility
3Cited by
20References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 10, 2006 |
| Grant date | Aug 30, 2011 |
| Priority date | — |
| Expiry date | Dec 22, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/114
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A resist composition of the present invention is obtained by dissolving a resin component (A) that displays changed alkali solubility under action of acid and an acid generator component (B) that generates acid upon exposure in an organic solvent (S), wherein the organic solvent (S) includes an aromatic organic solvent (S1). According to the present invention, a resist composition and a method of forming a resist pattern, in which the level of LWR is reduced, can be provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.