Patent · US Active

Template having alignment marks formed of contrast material

US8012395B2 · kind B2 · utility

13Cited by

210References

17Claims

0Family size

Assignee

Molecular Imprints, Inc. · US

Inventors

Kosta S. Selinidis · Austin, US
Byung-Jin Choi · Round Rock, US
Gerard Schmid · Guilford, US
Ecron D. Thompson · Round Rock, US
Ian McMackin · Austin, US

Key dates

Filing date	May 12, 2009
Grant date	Sep 6, 2011
Priority date	—
Expiry date	Jul 16, 2029

Classification

Technology area (CPC G)Physics
CPC primaryG02B5/1838
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Imprint lithography substrates may include alignment marks formed of high contrast material. Exemplary methods for forming alignment marks having high contrast material are described.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.