Ecron D. Thompson
7Patents
4h-index
19Co-inventors
50Inventor score
Filing activity: Oct 27, 2003 → Oct 31, 2019
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7122482B2 | Methods for fabricating patterned features utilizing imprint lithography | Performing Operations; Transporting | 105 | Expired |
| US8012395B2 | Template having alignment marks formed of contrast material | Physics | 13 | Active |
| US8652393B2 | Strain and kinetics control during separation phase of imprint process | Physics | 13 | Active |
| US7768624B2 | Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques | Physics | 8 | Active |
| US11215921B2 | Residual layer thickness compensation in nano-fabrication by modified drop pattern | Electricity | 1 | Active |
| US11161280B2 | Strain and kinetics control during separation phase of imprint process | Physics | 0 | Active |
| US11131922B2 | Imprint lithography template, system, and method of imprinting | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.