Charged particle beam apparatus, method of adjusting astigmatism using same and method of manufacturing device using same
US8013315B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 11, 2007 |
| Grant date | Sep 6, 2011 |
| Priority date | — |
| Expiry date | Nov 8, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/216
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A charged particle beam apparatus 300 for observing and estimating a sample W by applying a charged particle beam to sample W to detect secondary charged particles, such as electrons emitted from the sample, reflected electrons and backscattered electrons comprises astigmatism adjusting means 17 for adjusting astigmatism of the charged particle beam. Astigmatism adjusting means 17 is supplied with a correction voltage which maximizes a focal estimation value obtained from a pattern formed on sample W. Astigmatism adjusting means 17 is a multipole including a plurality of pairs of electrodes or coils facing each other to place the optical axis of the charged particle beam at the center. Also disclosed is a charged particle beam apparatus 400 capable of observation and estimation of a sample surface in a condition where no charge up exists over the whole sample W.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.