Patent · US Active

OPC models generated from 2D high frequency test patterns

US8015513B2 · kind B2 · utility

0Cited by

0References

17Claims

0Family size

Assignee

TEXAS INSTRUMENTS INCORPORATED · US

Inventors

Ashesh Parikh · Frisco, US
Willie J. Yarbrough · Sunnyvale, US

Key dates

Filing date	May 30, 2008
Grant date	Sep 6, 2011
Priority date	—
Expiry date	Feb 26, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/68
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A method of generating a scalable OPC model for composing reticle pattern files from IC layouts using 2D test patterns is disclosed. The 2D test patterns include basic features which replicate features found in advanced ICs. Variations of feature dimensions and structure pitches provide measurement data which enables the scalability of the OPC model. A method of checking reticle pattern files for features which cannot be modeled by the scalable OPC model is also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.