Method for design and manufacture of a reticle using a two-dimensional dosage map and charged particle beam lithography
US8017286B2 · kind B2 · utility
12Cited by
14References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 12, 2009 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Jan 29, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
In the field of semiconductor device production, a method for manufacturing a surface using two-dimensional dosage maps is disclosed. A set of charged particle beam shots for creating an image on the surface is determined by combining dosage maps for a plurality of shots into the dosage map for the surface. A similar method is disclosed for fracturing or mask data preparation of a reticle image. A method for creating glyphs is also disclosed, in which a two-dimensional dosage map of one or more shots is calculated, and the list of shots and the calculated dosage map are stored for later reference.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.