Termination trench structure for mosgated device and process for its manufacture
US8017494B2 · kind B2 · utility
1Cited by
4References
19Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 25, 2008 |
| Grant date | Sep 13, 2011 |
| Priority date | — |
| Expiry date | Jan 25, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/252
Abstract
A process for the fabrication of a MOSgated device that includes a plurality of spaced trenches in the termination region thereof.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.