Patent · US Active

Apparatus and methods for evaporation including test wafer holder

US8022448B1 · kind B1 · utility

28Cited by
1References
13Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 5, 2010
Grant dateSep 20, 2011
Priority date
Expiry dateOct 5, 2030

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/68785
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

Apparatus and methods for evaporating metal onto semiconductor wafers are disclosed. One such apparatus can include an evaporation chamber that includes a wafer holder, such as a dome, and a test wafer holder that is separate and spaced apart from the wafer holder. In certain implementations, the test wafer can be coupled to a cross beam supporting at least one shaper. A metal can be evaporated onto production wafers positioned in the wafer holder while metal is evaporated on a test wafer positioned in a test wafer holder. In some instances, the production wafers can be GaAs wafers. The test wafer can be used to make a quality assessment about the production wafers.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.