Device and method for high-intensity uniform illumination with minimal light reflection for use in microscopes
US8023184B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 13, 2007 |
| Grant date | Sep 20, 2011 |
| Priority date | — |
| Expiry date | Nov 15, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B21/06
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A device for high-intensity uniform illumination with minimal light reflection for use in reflective-type microscopes has a light source with a uniform emission and the following components, arranged in succession in the emission direction: a lens combination with a short focal length, the focal length of the lens combination being adjusted in such a way that the light source is projected to infinity; a rectangular diaphragm aperture, which is located on the rear focal plane of the lens combination, the Fourier plane of the lens combination being situated on the plane; an additional lens with a focal length, through which the rectangular diaphragm aperture is projected onto the intermediate image plane of the microscope; and a circular diaphragm, onto which the light source is projected in sharp focus and which is located on the rear focal plane of the additional lens.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.