Fluid handling device with directionally-biased wetting surface
US8028722B2 · kind B2 · utility
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20Claims
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Key dates
| Filing date | Sep 15, 2006 |
| Grant date | Oct 4, 2011 |
| Priority date | — |
| Expiry date | Jul 12, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/0318
- WIPO fieldMechanical elements
- WIPO sectorMechanical engineering
Abstract
A fluid handling device with an anisotropic wetting surface including a substrate with a multiplicity of asymmetric substantially uniformly shaped asperities thereon. Each asperity has a first asperity rise angle and a second asperity rise angle relative to the substrate. The asperities are structured to present a desired retentive force ratio (f1/f2) greater or less than unity caused by asymmetry between the first asperity rise angle and the second asperity rise angle according to the formula: f3/f2=sin(ω3+½Δθ0)/sin(ω2+½Δθ0).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.