Photosensitive compositions based on polycyclic polymers for low stress, high temperature films
US8030425B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 3, 2008 |
| Grant date | Oct 4, 2011 |
| Priority date | — |
| Expiry date | Oct 18, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/0382
- WIPO fieldMacromolecular chemistry, polymers
- WIPO sectorChemistry
Abstract
Vinyl addition polymer compositions, methods for forming such compositions, methods for using such compositions to form microelectronic and optoelectronic devices are provided. The vinyl addition polymer encompassed by such compositions has a polymer backbone having two or more distinct types of repeat units derived from norbornene-type monomers independently selected from monomers of Formula I:wherein each of X, m, R1, R2, R3, and R4 is as defined herein and wherein a first type of repeat unit is derived from a glycidyl ether substituted norbornene monomer and a second type of repeat unit is derived from an aralkyl substituted norbornene monomer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.