Substrate processing apparatus and substrate processing method
US8034190B2 · kind B2 · utility
15Cited by
8References
17Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 8, 2010 |
| Grant date | Oct 11, 2011 |
| Priority date | — |
| Expiry date | Mar 8, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S438/908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block comprises washing processing units and an interface transport mechanism. Before a substrate is subjected to exposure processing by the exposure device, the substrate is transported to a washing processing unit by the interface transport mechanism. The substrate is washed and dried by the washing processing unit.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.