Radio frequency power control system
US8040068B2 · kind B2 · utility
120Cited by
7References
46Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Feb 5, 2009 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | Mar 19, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH03H7/38
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.