Patent · US Active

Substrate processing apparatus

US8040488B2 · kind B2 · utility

2Cited by

8References

12Claims

0Family size

Assignee

Sokudo Co., Ltd. · JP

Inventors

Shuichi Yasuda · Kyoto, JP
Masashi Kanaoka · Kyoto, JP
Koji Kaneyama · Kyoto, JP
Tadashi Miyagi · Kyoto, JP
Kazuhito Shigemori · Kyoto, JP
Toru Asano · Kyoto, JP
Yukio Toriyama · Kyoto, JP
Takashi Taguchi · Saitama, JP
Tsuyoshi Mitsuhashi · Kyoto, JP
Tsuyoshi Okumura · Higashiosaka, JP

Key dates

Filing date	Dec 6, 2005
Grant date	Oct 18, 2011
Priority date	—
Expiry date	Aug 3, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/67178
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a processing block for liquid immersion exposure processing, and an interface block. An exposure device is arranged adjacent to the interface block. The processing block for liquid immersion exposure processing comprises a coating processing group for resist cover film and a removal processing group for resist cover film. The resist cover film is formed in the processing block for liquid immersion exposure processing before the exposure processing. The resist cover film is removed in the processing block for liquid immersion exposure processing after the exposure processing.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.