Patent · US Active

Method for improving edge handling chuck aerodynamics

US8042254B1 · kind B1 · utility

0Cited by
17References
19Claims
0Family size

Assignee

Inventors

Key dates

Filing dateDec 21, 2007
Grant dateOct 25, 2011
Priority date
Expiry dateAug 23, 2030

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T279/18
  • WIPO fieldSemiconductors
  • WIPO sectorElectrical engineering

Abstract

An edge-handling chuck, a system for holding and rotating a test substrate at a high speed and a method for chucking a rotating substrate are disclosed. The Chuck includes a plate having a central axis, a fluid opening and a top surface with a varied topography characterized by symmetry about the central axis. The topography is such that a volume flow rate of fluid between the fluid opening and a periphery of the top surface sufficient to counteract substrate sagging is significantly less than a volume flow rate needed for a similar but flat-surfaced chuck to similarly counteract such sagging. The system may further include a spindle motor and a gas system that supplies gas through the fluid opening to a gap between the top surface and a back surface of the substrate. A radial velocity of the fluid through the gap is approximately constant.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.