Electrode/probe assemblies and plasma processing chambers incorporating the same
US8043470B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 21, 2007 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Aug 24, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32605
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The present invention relates generally to plasma processing chambers and electrode assemblies used therein. According to one embodiment, an electrode assembly comprises a thermal control plate, a silicon-based showerhead electrode, and a probe assembly comprising an electrically conductive probe body and a silicon-based cap. The electrode assembly is configured such that the handedness of a threaded engagement of the silicon-based cap and a head section of the probe body and the handedness of the threaded engagement of the thermal control plate and a mid-section of the probe body have a common direction of rotation. Thereby, an application of torque to the silicon-based cap in a tightening direction of rotation tightens both threaded engagements. Further, the electrode assembly is configured such that the threaded engagement of the silicon-based cap and a head section of the probe body permits repetitive non-destructive engagement and disengagement of the silicon-based cap and the probe body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.