Method and system for calibrating measurement tools for semiconductor device manufacturing
US8044668B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 29, 2005 |
| Grant date | Oct 25, 2011 |
| Priority date | — |
| Expiry date | Jul 29, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG05B2219/45031
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
A method and system for calibrating a plurality of measurement systems. The method includes obtaining a first plurality of calibration standards. The first plurality of calibration standards is associated with a plurality of predetermined values. Additionally, the method includes measuring the first plurality of calibration standards by a plurality of measurement systems to obtain a first plurality of measured values, processing information associated with the first plurality of measured values, and selecting a first measurement system from the plurality of measurement systems based on at least information associated with the first plurality of measured values. Moreover, the method includes calibrating the first measurement system with the first plurality of calibration standards, obtaining a second plurality of calibration standards, and measuring the second plurality of calibration standards by the first measurement system to obtain a second plurality of measured values.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.