Systems and methods for alignment of laser beam(s) for semiconductor link processing
US8049135B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 5, 2006 |
| Grant date | Nov 1, 2011 |
| Priority date | — |
| Expiry date | May 5, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method makes a discrete adjustment to static alignment of a laser beam in a machine for selectively irradiating conductive links on or within a semiconductor substrate using the laser beam. The laser beam propagates along a beam path having an axis extending from a laser to a laser beam spot at a location on or within the semiconductor substrate. The method generates, based on at least one measured characteristic of the laser beam, at least one signal to control an adjustable optical element of the machine effecting the laser beam path. The method also sends said at least one signal to the adjustable optical element. The method then adjusts the adjustable optical element in response to said at least one signal so as to improve static alignment of the laser beam path axis.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.