Adjustment method for position detection apparatus, exposure apparatus, and device fabrication method
US8049891B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 8, 2008 |
| Grant date | Nov 1, 2011 |
| Priority date | — |
| Expiry date | May 11, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7092
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides an adjustment method for a position detection apparatus which comprises an optical system including first and second optical members whose positions can be changed, and detects a position of an object, comprising the steps of calculating a value representing an asymmetry of a detection signal of a light which enters a photoelectric conversion device via the optical system, for each of a plurality of positions of the first optical member in a direction perpendicular to an optical axis of the optical system, specifying a position of the object in the direction of the optical axis, at which the value is insensitive, for each of the plurality of positions, and adjusting a position of the second optical member in the direction perpendicular to the optical axis based on the value at the position of the object specified in the specifying step.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.