Zone-optimized mirrors and optical systems using same
US8050380B2 · kind B2 · utility
0Cited by
18References
20Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 5, 2009 |
| Grant date | Nov 1, 2011 |
| Priority date | — |
| Expiry date | May 22, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/067
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A zone-optimized mirror (MZ) for reflecting extreme ultraviolet (EUV) or X-ray radiation (18) includes a reflective surface (S) having two or more substantially discrete zones (Z1, Z2, . . . Zn) that include respective coatings (C1, C2, . . . Cn). Each coating is configured to optimally reflect a select range of incident angles of the radiation incident thereon. An EUV optical system (10) and an EUV lithography system (200) that includes at least one zone-optimized mirror are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.