Lens cleaning module for immersion lithography apparatus
US8054444B2 · kind B2 · utility
1Cited by
5References
21Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 7, 2005 |
| Grant date | Nov 8, 2011 |
| Priority date | — |
| Expiry date | Oct 25, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70341
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lens cleaning module for a lithography system having an exposure apparatus including an objective lens is provided. The lens cleaning module includes a scanning stage for supporting a wafer beneath the objective lens. A cleaning module is provided adjacent to the scanning stage for cleaning the objective lens in a non-manual cleaning process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.