Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process
US8057985B2 · kind B2 · utility
31Cited by
11References
11Claims
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Key dates
| Filing date | Aug 27, 2009 |
| Grant date | Nov 15, 2011 |
| Priority date | — |
| Expiry date | Jul 8, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/143
- WIPO fieldOrganic fine chemistry
- WIPO sectorChemistry
Abstract
A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.