Formation of photoconductive and photovoltaic films
US8061299B2 · kind B2 · utility
Inventor
Key dates
| Filing date | Feb 17, 2005 |
| Grant date | Nov 22, 2011 |
| Priority date | — |
| Expiry date | Feb 17, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/34
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A deposition system includes a vacuum reaction chamber with a substrate holder positioned in it. The substrate holder is for carrying a substrate therein. A sputtering apparatus is also positioned in the vacuum reaction chamber. The sputtering apparatus is configured to direct sputtered material towards the substrate to form a sputtered material region thereon. A plasma enhanced chemical vapor deposition (PECVD) apparatus is positioned in the vacuum reaction chamber. The PECVD apparatus is configured to deposit a PECVD material region thereon the substrate. The first PECVD apparatus includes a first PECVD electrode movable from a first position towards the substrate and a second position away from the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.