Patent · US Active

Non-shot-noise-limited source for electron beam lithography or inspection

US8063365B1 · kind B1 · utility

4Cited by

4References

11Claims

0Family size

Assignee

KLA-TENCOR CORPORATION · US

Inventors

Keith Standiford · Roseville, US
Alan D. Brodie · Palo Alto, US

Key dates

Filing date	Dec 2, 2008
Grant date	Nov 22, 2011
Priority date	—
Expiry date	Sep 1, 2029

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/31789
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

One embodiment relates to an electron source apparatus for an electron beam lithography tool or an electron beam inspection tool. A cathode is configured to emit electrons, and an anode is configured to accelerate the electrons so as to create an electron beam. There are no beam apertures in the electron source apparatus that are positioned at non-focal planes. An electron lens may be configured to focus the electron beam to form a cathode image at a focal plane, and a beam aperture may positioned at the focal plane. Other embodiments, aspects and features are also disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.