Magnetic random access memory with an elliptical magnetic tunnel junction
US8064245B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | May 15, 2009 |
| Grant date | Nov 22, 2011 |
| Priority date | — |
| Expiry date | Sep 7, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG11C11/1675
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A magnetic tunnel junction (MTJ)-based magnetic random access memory (MRAM) cell with a thermally assisted switching (TAS) writing procedure and methods for manufacturing and using same. The TAS MTJ-based MRAM cell includes a magnetic tunnel junction that is formed with an anisotropic shape and that comprises a ferromagnetic storage layer, a reference layer, and an intermediate insulating layer. The ferromagnetic storage layer has a magnetization that is adjustable above a high temperature threshold; whereas, the reference layer has a fixed magnetization. The ferromagnetic storage layer is provided with a magnetocrystalline anisotropy that is oriented essentially perpendicular to a long axis of the anisotropic shape of the magnetic tunnel junction. The TAS MTJ-based MRAM cell advantageously limits the effects of dispersion in the magnetic tunnel junction shape anisotropy coming from the fabrication process and features a lower power consumption when compared with conventional MTJ-based MRAM and TAS MTJ-based MRAM cells.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.