Substrate cleaning apparatus and substrate cleaning method
US8066020B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 27, 2006 |
| Grant date | Nov 29, 2011 |
| Priority date | — |
| Expiry date | Jan 5, 2029 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B3/10
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A substrate cleaning apparatus, comprises a process tank that holds a mixture containing a hydrogen peroxide solution and sulfuric acid and is used for cleaning a substrate immersed in said mixture; circulation piping that extends between a primary side of said process tank on which said mixture is injected into said process tank and a secondary side of said process tank on which said mixture is discharged from said process tank and has a pump for causing circulation of said mixture; a heater disposed in said circulation piping configured to heat said mixture to a predetermined temperature; a chemical injection pipe configured to inject a hydrogen peroxide solution into said circulation piping at a position between the primary side of said process tank and a secondary side, which is a downstream side, of said heater; and a filter disposed in said circulation piping configured to remove particles in said mixture.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.