Surface treatment solution for the fine surface processing of a glass substrate containing multiple ingredients
US8066898B2 · kind B2 · utility
1Cited by
8References
16Claims
0Family size
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Key dates
| Filing date | Sep 25, 2008 |
| Grant date | Nov 29, 2011 |
| Priority date | — |
| Expiry date | Jan 26, 2030 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03C15/00
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A surface treatment solution for finely processing a glass substrate containing multiple ingredients is used for the construction of liquid crystal-based or organic electroluminescence-based flat panel display devices without invoking crystal precipitation and/or increasing surface roughness. An etching solution of the invention contains, in addition to hydrofluoric acid (HF) and ammonium fluoride (NH4F), at least one acid whose dissociation constant is larger than that of HF. The concentration of the acid in the solution can advantageously be adjusted to maximize the etching rate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.