Optical system of an illumination device of a projection exposure apparatus

US8068279B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Karl-Heinz Schuster · Oberkochen, DE
• Juergen Hartmaier · Oberkochen, DE
• Manfred Maul · Aalen, DE
• Dieter Schmerek · Hennef (Sieg), DE
• Detlev Mueller · Ellwangen, DE
• Otto Hahnemann · Nördlingen, DE
• Frank Marianek · Oberkochen, DE
• Gundula Weiss · Aalen, DE
• Damian Fiolka · Oberkochen, DE

Key dates

• Filing date: Mar 13, 2007
• Grant date: Nov 29, 2011
• Expiry date: Aug 21, 2029

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/70966
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

The disclosure relates to an optical system of an illumination device of a microlithographic projection exposure apparatus, including at least one first light-conductance-increasing element having a plurality of diffractively or refractively beam-deflecting structures extending in a common first preferred direction the light-conductance-increasing element having an optically uniaxial crystal material in such a way that the optical crystal axis of the crystal material is substantially parallel or substantially perpendicular to the first preferred direction.