Gundula Weiss
8Patents
2h-index
27Co-inventors
43Inventor score
Filing activity: Mar 13, 2007 → Feb 27, 2015
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US8068279B2 | Optical system of an illumination device of a projection exposure apparatus | Physics | 9 | Active |
| US8724086B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 3 | Active |
| US9946161B2 | Optical system for a microlithographic projection exposure apparatus and microlithographic exposure method | Physics | 1 | Active |
| US8891057B2 | Microlithographic projection exposure apparatus | Physics | 1 | Active |
| US8259392B2 | Method of producing a diffractive optical element and diffractive optical element produced by such a method | Physics | 0 | Active |
| US9025131B2 | Optical beam deflecting element, illumination system including same, and related method | Physics | 0 | Active |
| US9052606B2 | Microlithographic projection exposure apparatus | Physics | 0 | Active |
| US10146135B2 | Microlithographic projection exposure apparatus having a multi-mirror array with temporal stabilisation | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.