Patent · US Active

Cleaning of an extraction aperture of an ion source

US8071956B2 · kind B2 · utility

1Cited by

2References

19Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

Craig R. Chaney · Rockport, US
Alexander S. Perel · Danvers, US
Leo V. Klos · Newburyport, US

Key dates

Filing date	Mar 10, 2010
Grant date	Dec 6, 2011
Priority date	—
Expiry date	Jul 20, 2030

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/024
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

An ion source includes an arc chamber housing defining an arc chamber having an extraction aperture, and a wiper assembly comprising a wiper positioned outside the arc chamber in a parked position and configured to be driven from the parked position to operational positions to clean the extraction aperture. A wiper assembly for an ion source includes a wiper configured to be positioned outside an arc chamber of the ion source when in a parked position and driven from the parked position to operational positions to clean an extraction aperture of the ion source.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.