Leo V. Klos
14Patents
7h-index
21Co-inventors
66Inventor score
Filing activity: Sep 22, 1983 → Apr 8, 2011
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7138768B2 | Indirectly heated cathode ion source | Electricity | 35 | Expired |
| US4744709A | Low deflection force sensitive pick | Emerging Cross-Sectional Technologies | 14 | Expired |
| US5629528A | Charged particle beam system having beam-defining slit formed by rotating cyclinders | Electricity | 14 | Expired |
| US6403972B1 | Methods and apparatus for alignment of ion beam systems using beam current sensors | Electricity | 11 | Expired |
| US7102139B2 | Source arc chamber for ion implanter having repeller electrode mounted to external insulator | Electricity | 9 | Expired |
| US7491947B2 | Technique for improving performance and extending lifetime of indirectly heated cathode ion source | Electricity | 9 | Active |
| US7276847B2 | Cathode assembly for indirectly heated cathode ion source | Electricity | 8 | Expired |
| US6448567B1 | Method and apparatus for shielding a valve gate and other valve parts | Mechanical Engineering; Lighting; Heating | 7 | Expired |
| US4931776A | Fluid flow sensor with flexible vane | Electricity | 7 | Expired |
| US8071956B2 | Cleaning of an extraction aperture of an ion source | Electricity | 1 | Active |
| US8455839B2 | Cleaning of an extraction aperture of an ion source | Electricity | 1 | Active |
| US8049192B2 | Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter | Electricity | 1 | Active |
| US9076625B2 | Indirectly heated cathode cartridge design | Electricity | 0 | Active |
| US4602713A | Multiple wafer holder for a wafer transfer system | Electricity | 0 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.