Patent · US Active

Debris mitigation system and lithographic apparatus

US8071963B2 · kind B2 · utility

5Cited by
7References
19Claims
0Family size

Assignees

Inventors

Key dates

Filing dateDec 27, 2006
Grant dateDec 6, 2011
Priority date
Expiry dateSep 14, 2029

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05G2/0094
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

A debris mitigation system for trapping contaminant material coming from a debris-generating radiation source. The system includes a contamination barrier constructed and arranged to rotate about an axis, and a magnet structure constructed and arranged to provide a magnetic field for deflecting charged debris from the radiation source. The magnet structure is constructed and arranged to provide a magnetic field through the contamination barrier. The magnetic field, when passing through the contamination barrier, is oriented along planes generally coinciding with the axis of rotation of the contamination barrier.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.