Vacuum processing apparatus
US8075691B2 · kind B2 · utility
6Cited by
9References
6Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Oct 14, 2009 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Aug 6, 2030 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T29/53687
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Disclosed herein is a vacuum processing apparatus for performing a desired process for a substrate after establishing a vacuum atmosphere therein. More particularly, the vacuum processing apparatus includes a vacuum chamber, which is divided into a chamber body and an upper cover. The upper cover is configured to be easily opened away from and closed to the chamber body.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.