Materials for imprint lithography
US8076386B2 · kind B2 · utility
153Cited by
279References
19Claims
0Family size
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Key dates
| Filing date | Feb 23, 2004 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Apr 25, 2028 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D11/101
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
The present invention is directed to a material for use in imprint lithography that features a composition having a viscosity associated therewith and including a surfactant, a polymerizable component, and an initiator responsive to a stimuli to vary the viscosity in response thereto, with the composition, in a liquid state, having the viscosity being lower than about 100 centipoises, a vapor pressure of less than about 20 Torr, and in a solid cured state a tensile modulus of greater than about 100 MPa, a break stress of greater than about 3 MPa and an elongation at break of greater than about 2%.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.