Patent · US Active

Integrally fabricated micromachine and logic elements

US8076738B2 · kind B2 · utility

2Cited by

3References

12Claims

0Family size

Assignee

Infineon Technologies AG · DE

Inventors

Stefan Kolb · Unterschleißheim, DE
Reinhard Mahnkopf · Oberhaching, DE
Christian Pacha · Birkenfeld, DE
Bernhard Winkler · Birkenfeld, DE
Werner Weber · Munich, DE

Key dates

Filing date	Sep 28, 2007
Grant date	Dec 13, 2011
Priority date	—
Expiry date	Sep 17, 2028

Classification

Technology area (CPC H)Electricity
CPC primaryH10D30/62
WIPO fieldMeasurement
WIPO sectorInstruments

Abstract

Embodiments of the invention are related to micromachine structures. In one embodiment, a micromachine structure comprises a first electrode, a second electrode, and a sensing element. The sensing element is mechanically movable and is disposed intermediate the first and second electrodes and adapted to oscillate between the first and second electrodes. Further, the sensing element comprises a FinFET structure having a height and a width, the height being greater than the width.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.