Method of preparing components, prepared component, lithographic apparatus and device manufacturing method
US8077287B2 · kind B2 · utility
0Cited by
13References
22Claims
0Family size
Assignee
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Key dates
| Filing date | May 7, 2004 |
| Grant date | Dec 13, 2011 |
| Priority date | — |
| Expiry date | Mar 24, 2029 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70916
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of preparing components for use in a vacuum chamber of a lithographic apparatus is disclosed. The method includes coating the component with a non-metallic material. The method may further include treating the coating so as to harden the coating. Preferably, the coating material is a hydrogen silsesquioxane (HSQ), which may be applied via spraying, brushing, or spinning and can be treated by heating or by irradiation with an electron beam. The resulting components strongly reduce outgassing of water and hydrocarbons when subjected to a vacuum environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.