Patent · US Active

Microlithographic projection exposure apparatus illumination optics

US8085382B2 · kind B2 · utility

3Cited by

9References

76Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventor

Alexander Kohl · Aalen, DE

Key dates

Filing date	Jul 13, 2007
Grant date	Dec 27, 2011
Priority date	—
Expiry date	Jan 20, 2030

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70566
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Optics, such as, for example, microlithographic projection exposure apparatus illumination optics, as well as related systems, methods, components and devices are disclosed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.