System and method for providing access to an encapsulated device
US8088651B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 15, 2008 |
| Grant date | Jan 3, 2012 |
| Priority date | — |
| Expiry date | Jul 22, 2030 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB81C99/004
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
A method for providing access to a feature on a device wafer, and located outside an encapsulation region is described. The method includes forming a cavity in the lid wafer, aligning the lid wafer with the device wafer so that the cavity is located substantially above the feature, and removing material substantially uniformly from the bottom surface of the lid wafer, until an aperture is formed at the cavity, over the feature on the device wafer. By removing material from the lid wafer in a substantially uniform manner, difficulties with the prior art procedure of saw cutting, such as alignment and debris generation, are avoided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.